MeSH Browser

MeSH Supplementary: poly(4-hydroxystyrene-co-2-ethyl-2-adamantyl methacrylate-co-phenyl methacrylate dimethylsulfonium nonaflate)
Unique ID: C505215
RDF Unique Identifier: http://id.nlm.nih.gov/mesh/C505215
Entry Term(s): poly(HOST-co-EAMA-co-PAG)
Registry Number: 0
Heading Mapped to: *Polymethacrylic Acids; *Sulfonium Compounds
Frequency: 1
Note: an EUV resist; structure in first source
Source: J Nanosci Nanotechnol 2005 Jul;5(7):1181-3
Date of Entry: 2005/11/09

poly(4-hydroxystyrene-co-2-ethyl-2-adamantyl methacrylate-co-phenyl methacrylate dimethylsulfonium nonaflate) MeSH Supplementary Concept Data 2024